Welcome on the website of the Metrology for future 3D-technologies — METRO4-3D project.
Duration: February 1, 2016 to January 31, 2019; Budget: 3.349.813,75 EUR
One driver of the semiconductor industry growth is the sustained realization of “Moore’s Law”, whereby the number of transistors in an integrated circuit doubles approximately every 2 years with an associated increase in circuit functionality, reduction in operational power, and, most important, a reduction in unit cost. These fast technological developments, including increased process and material complexity, as well as reduced tolerance levels for process excursions have increased the need for a more controlled manufacturing environment necessitating equivalent improvements and developments in metrology. The present evolution towards merging lab and Fab metrology implies that these developments are necessary for use both in the R&D phase as in the final production phase.
With the strong size dependence of many material problems and phenomena, metrology needs to be performed more and more on devices with realistic dimensions and on wafer scale.
In this project, we aim at assessing three metrology tools three separate metrology tools will be
This project has received funding from the European Union’s Horizon 2020 research and innovation programme under grant agreement No 688225.